Financings
LongPoint Adds to Its Family of Double Leveraged Single Stock ETFs
LongPoint expands Canada's only double-leveraged single stock ETF suite with AI and aerospace plays, targeting sophisticated retail demand.

Executive Summary
- LongPoint Asset Management Inc. announced the launch of three new Savvy Double Leveraged Single Stock ETFs (AMDU, MUU, ORBU) on the Toronto Stock Exchange (TSX).
- Trading commences on June 17, 2026.
- The ETFs provide 2X daily leveraged long exposure to Advanced Micro Devices (AMD), Micron Technology, and SpaceX.
- LongPoint positions itself as Canada's only provider of double-leveraged single stock ETFs.
- The products target sophisticated Canadian investors seeking tactical, high-conviction exposure to high-growth tech and aerospace sectors.
- SpaceX recently completed an IPO with an approximate $2 trillion USD valuation, driving strong investor demand for direct exposure.
Material Impact
- The launch is a standard product expansion for an active ETF manager.
- It does not represent a transformative M&A, a major strategic partnership, or a fundamental shift in the business model.
- Revenue impact will be incremental, driven by new assets under management (AUM) and management fees. Leveraged ETF structures typically carry higher expense ratios, which could boost fee income if inflows are strong.
- The news is expected and routine for an asset manager expanding its product suite to capture retail and sophisticated investor demand for leveraged tech/aerospace exposure.
- No material impact on stock price is anticipated beyond standard product launch noise.
MUU · Price
Company Overview
- LongPoint Asset Management Inc. is a Canadian-owned ETF provider.
- It currently manages 52 Canadian-listed ETFs with over $400 million in AUM.
- The firm specializes in leveraged and inverse products, including crude oil/natural gas ETFs, triple-levered index ETFs, and now double-leveraged single stock ETFs.
- Target market includes sophisticated investors seeking tactical, high-conviction sector exposure.